anybody tried optical with Ti3O5 instead of Ti2O3 by e-beam evaporation? Currently, we would like to establish the optical coating process with Ti2O3. But, we faced a problem that it is difficult to get a transparent film with Ti2O3 at 650nm consistenly, and the index is 2.26 while we target 2.30. I guessed that the O2 bleeding may be insufficent, lalthough my chamber pressure is already around 3E-4mbar @200C.If the chamber pressure is increased, the density of film may be very poor and creats problem for other materials.
Learn from literature that Ti3O5 may be more suitable for such coating process. Anybody has experience on this? Does it mean that we can get TiO2 film at low pressure? say 2 or 3E-4mbar. Will the melt at pocket be stable compared to Ti2O3?
Thanks in advance for your remarks.