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Subject: Re: sputter deposition of materials on different wafers
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Date: 08/14/03 at 9:18 PM
Posted by: Pat McMahon
In Reply to: sputter deposition of materials on different wafers posted by Abhiram Govindaraju on 07/30/03 at 6:21 PM:
It is good to see that you are still working in thin films. We will have to meet one of these days.
First, it is not the best idea to DC sputter Al films because of the oxide problems, although many people have done it with success.
Secondly, after the first few seconds of deposition the substrate is conducting because of the coating so it really doesn't matter.
Best of luck.
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