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Subject: Re: cvc 601 sputtering machine

Date: 01/29/03 at 11:05 PM
Posted by: Pat McMahon
E-mail: patmcmahon@earthlink.net
Message Posted:

In Reply to: cvc 601 sputtering machine posted by Abhiram Govindaraju on 01/28/03 at 2:20 PM:


Your message is somewhat confused. Item one is in conflict with item two. If the pressure is indeed 10(-6) then you will not get any sputtering as the pressure is too low. However with that low pressure you could never generate 4-5 amps of current.

Also you have not mentioned what material you are trying to deposit. Although I believe you said on an earlier post that you were depositing onto Si wafers, you never said what the deposition material was.

Since you do not see any plasma and do not get any deposition, it seems that you might have a short circuit in your sputtering electrode. Carefully disconnect the high voltage power supply and check the resistance to ground at the electrode. If you are not familiar with electronics and are not comfortable with doing this get someone who is knowledgeable and ask them to do it. This power supply can supply lethal shocks.


If you can give me some additional information, perhaps I can help.

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