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Subject: cvc 601 sputtering machine
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Date: 01/28/03 at 2:20 PM
Posted by: Abhiram Govindaraju
hi, my name is abhiram govindaraju.this is my second quest mail to the group.i would like to thank everyone of you who answered my questions for my previous mail.now i am coming up with a problem that i have been facing for a while.
i spent quite a while on this cvc 601 sputtering machine.
all i can say is that everything goes fine till the last step, but finally i don't see any plasma and there is no coating deposited on the wafers.
these are the parameters that i look into for DC sputtering
1.the ion gauge shows 2*10^(-6) torr.
2.the high vacuum precision gauge shows 3.5 to 5 mtorr.
3.i am using argon gas to generate plasma.
4.about 0.3kvolts of voltage and 4amps of current are used for the sputtering.
i have this problem always with the dc power generator.
once i start the generator,the voltage keeps falling all the time. i learnt from the manual that for dc sputtering
it needs aroung 6KW of power or roughly say 0.4-0.5 KV of voltage and 4-5amps of current.
i have run the experiment for almost 10times till to-date.
but never got a chance to see the plasma or the coating on the wafers.as i said before the system/chamber reaches high vacuum and the mechanical pump and cryogenic compressor are also working fine.
i would like to request the group to look into this and
kindly suggest me what to do to get rid of this situation.
as we bought this equipment thru a bidding agency, they are not able to give me the right information, though the system was working fine when we bought it.we saw that it was able to deposit material on the wafers.
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