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Subject: aluminum sputtering using cvc 601

Date: 07/09/03 at 1:18 PM
Posted by: Abhiram Govindaraju
E-mail: abhiram@mal.eng.sunysb.edu
Message Posted:

hi, my name is abhiram and i am here with this question,
i work on a cvc made sputtering machine and i am trying to sputter aluminum as of now.i maintain 1.6 to 1.65mtorr of argon gas pressure while sputtering.

the problem that i am facing is that there is no voltage regulator on my system.i can control the voltage thru the current control regulator, as you know current is inversly proportional to the voltage, so due to this i am not able to control the voltage directly.for 1.6mtorr of gas pressure i am not able to get a voltage of only 0.35kv and a current of around 2amps(though i can still increase the current with the regulator).
after running quite a few experiemnts i learnt that the power becomes stable for a definite gas pressure.if i decrease the argon gas pressure below 1.6mtorr, there is a lot of fluctuations in the voltage and current.so i would like to request to the group to let me know why am i not able to maintain the voltage high enough to obtain atleast 2kw of power with 500v of voltage and 4amps of current.
also let me know at what parameter levels of voltage, current and gas pressure do you generally sputter aluminum at?

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