| Home | Terms of Use | Site Map | Contact Us |
IndustryCommunity.com > Manufacturing Community > Forum of High Vacuum Technology/Processing/Coating > Message
Main Menu
Find

[ List Subjects ][ Post Message ]
[ View Followups ][ Post Followup ]

Subject: Question on dopant profile of 0.35micron, 0.25micron,0.13micron CMOS

Date: 07/03/03 at 2:47 PM
Posted by: Kavin
E-mail: futuremicrotech@yahoo.com
Message Posted:

Dear all,

Could you anyone tell me what is the meaning of 0.35 micron, 0.25 micron, and 0.13 micron? It means that the implantation and annealing parameters are fixed on certain values for certain technologies, therefore the dopant depth profiles (e.g. SIMS and SRP) are fixed for each technology?

Thanks.

Kavin


Follow Ups:


Post a Follow-up:

Name:
E-Mail:
Subject:

Message to Post:

 

Click here:
1999-2001 Sunlit Technology Co., Ltd. All rights reserved.