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Subject: Re: SiO2 deposition

Date: 05/20/03 at 7:28 PM
Posted by: Vasco Teixeira
E-mail: vasco@fisica.uminho.pt
Message Posted:

In Reply to: SiO2 deposition posted by Maciej Wojdak on 05/16/03 at 6:33 AM:

Dear Maciej

Why not use Si a target and deposit in reactive mode? Si can be deposited by DC sputtering.
How do you intend to produce the thick coating of SiO2?.

Regargds

Vasco


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