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Subject: varying the distance between the target material and the substrate holder
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Date: 04/30/03 at 2:58 PM
Posted by: Abhiram Govindaraju
hi all,does any one of you know how to vary the distance between the target material and the substrate holder in a cvc made sputtering machine.if any one of you worked on it in the past could you help me figure out the possible ways to do the same.
all i am looking for is to vary the distance between the substrate and the target so that i can check out the deposition rates at various levels of height of the substrate above the target.
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