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Subject: Re: Problem to sputter TiN for aluminum alloy substrate

Date: 07/09/03 at 3:05 AM
Posted by: Shi Xu
E-mail: shixu@nanofilm.com.sg
Message Posted:

In Reply to: Problem to sputter TiN for aluminum alloy substrate posted by Amy Smith on 01/01/03 at 6:38 AM:

It is best to use pulsed DC power supply as the bias energy source.
We have a Pulsed DC power supply that may fit your requirement.

Negative 0-600 V
Pulse frequency: 20 - 120 KHz
Duty Cycle: 20 - 80%
Pulse current: 10A

Shi Xu


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