[ List Subjects ][ Current Board ][ Post Message ]
Subject: Re: Problem to sputter TiN for aluminum alloy substrate
[ View Followups ][ Post Followup ]
Date: 07/09/03 at 3:05 AM
Posted by: Shi Xu
In Reply to: Problem to sputter TiN for aluminum alloy substrate posted by Amy Smith on 01/01/03 at 6:38 AM:
It is best to use pulsed DC power supply as the bias energy source.
We have a Pulsed DC power supply that may fit your requirement.
Negative 0-600 V
Pulse frequency: 20 - 120 KHz
Duty Cycle: 20 - 80%
Pulse current: 10A
Post a Follow-up: