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Subject: Re: cvc 601 sputtering machine
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Date: 01/27/03 at 4:49 PM
Posted by: abhiram Govindaraju
In Reply to: Re: cvc 601 sputtering machine posted by Pat McMahon on 12/08/02 at 9:42 PM:
hi, my name is abhiram govindaraju, this is my second e-mail to the industry community group.i would like to thank people who responded to my previous mail.
i would like to request the group again to help me out of this situation.i have been working on the cvc-601 sputtering machine almost for a while.i follow the steps given in the manual accordingly, but i was never able to see the coating on the wafers(silicon).could some one give me the details of the parameters that i need to alter while working on this situation.
right now when ever i run the experiment i maintain these readings for DC-sputtering.
1.2*10^(-6) on the ion gauge.
2.3.5 to 5mtorr on the high vacuum precision gauge.
3.i use argon gas(about 10- 13 psi)
4.about 0.4Kvolts of voltage and 4amps of current.
could some one correct me if i am making a mistake anywhere.
i would like to request you to be more clear and specific.if you could give me a website which gives all the details of the cvc sputtering i am very much thankful to you.
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