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Subject: Problem to sputter TiN for aluminum alloy substrate
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Date: 01/01/03 at 6:38 AM
Posted by: Amy Smith
Dear PVD experts,
I have problem doing reactive sputtering TiN for aluminum alloy substrate. When the negative bias was applied to the substrate, I've got lot of micro-arc on the aluminum alloy samples. I have no problem coating TiN for stainless substrate using a -100V bias and coating at 400 degree C. But what would I do for aluminum alloy substrate??
Any advise would be helpful.
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