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Subject: Need help with SiO2 sputtering

Date: 11/03/02 at 4:10 PM
Posted by: Tony Bollinger
E-mail: abolling@uiuc.edu
Message Posted:

I am currently trying to RF sputter ~80nm film of SiO2 but when I look at it under an SEM the surface is very rough. The sputtering has been done at room temperature using 4mTorr argon and a pure SiO2 target. Any suggestions on how I could alter the sputtering to improve uniformity?

Thanks for any help.

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