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Date: 09/10/02 at 1:18 PM
Posted by: Donald Mattox
E-mail: donmattox@svc.org

In Reply to: plasma assisted evaporation posted by YC Zhang on 09/10/02 at 5:50 AM:

A problem with using an e-beam evaporator with a plasma is that the e-beam filament is at a high negative potential and will be sputtered by the positive ions. This will erode the electron-emitting filament. If you really want to have a plasma near the substrate you need to put a plate across the chamber with a hole in it to allow the e-beam to pass through. Then the filament part of the chamber can be at a low pressure while the deposition part of the chamber can be kept at a higher pressure so that a plasma can be sustained. Don Mattox P.S. If you are plasma cleaning glass use an air (oxygen) plasma.

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