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Subject: plasma assisted evaporation

Date: 09/10/02 at 5:50 AM
Posted by: YC Zhang
E-mail: eyczhang@ntu.edu.sg
Message Posted:

In our new Leybold e-beam evaporator, we have a RF power added to the substrate holder to generate plasma under Ar evironment to clean the substrate surface before coating. I don't know whether this plasma can be used as the assisting plasma during the evaporation to make a better smoothness and adhesion of the thin film. Any advice is welcomed.

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