| Home | Terms of Use | Site Map | Contact Us |
IndustryCommunity.com > Manufacturing Community > Forum of High Vacuum Technology/Processing/Coating > Message
Main Menu
Find

[ List Subjects ][ Current Board ][ Post Message ]
[ View Followups ][ Post Followup ]

Subject: Re: SiO2 rf magnetron sputtering

Date: 10/09/01 at 2:55 PM
Posted by: Ted Van Vorous
E-mail: cathodes@uswest.net
Message Posted:

In Reply to: SiO2 rf magnetron sputtering posted by Mike C on 10/09/01 at 5:49 AM:

Mike,
Use a slightly higher argon pressure than for
DC magnetron, ie,3-5 microns. Dope with some
oxygen at about 10%if the film has a yellowish or
brownish color indicative of SiOx, ie, loss of
some oxygen in the SiO2 during deposition.
It is extremely difficult to deposit films free
of microporosity.
Ted V V


Follow Ups:


Post a Follow-up:

Name:
E-Mail:
Subject:

Message to Post:

 

Click here:
1999-2001 Sunlit Technology Co., Ltd. All rights reserved.