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Date: 05/02/02 at 8:44 PM
Posted by: Donald Mattox
E-mail: donmattox@svc.org

In Reply to: PE-CVD Coating with pure Si posted by Rudy O'Doherty on 04/30/02 at 10:35 AM:

Very tough problem. At low deposition temperatures you will get amorphous silicon. To get high quality silicon lattice structure will require a "high" substrate temperature. This will create a problem because the high ceofficient of thermal expansion of the aluminum will create a lot of stress between the coating and substrate when it cools down. This will probably give poor adhesion. Don Mattox Society of Vacuum Coaters

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