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Subject: Re: Growth of particles on copper masks in CD-R manufacturing

Date: 03/14/02 at 6:45 PM
Posted by: Donald Mattox
E-mail: donmattox@svc.org
Message Posted:

In Reply to: Growth of particles on copper masks in CD-R manufacturing posted by Jeroen van 't Erve on 02/06/02 at 5:14 AM:

Some more comments. The mask or the surface of the polymer may be getting a charge buildup if the magnetron is unbalanced giving elecron bombardment of the surfaces. Bombardment by reflected high energy neutrals from the cathode can be causing a charge buildup if the pressure is low. They can cause secondary electron emission. Moisture aggrivates the grow of silver dendrites so the maks should be kept dry at all times. As the silver film grows thicker and more porous it will retain moisture to a greater extent. Don Mattox

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