| Home | Terms of Use | Site Map | Contact Us |
IndustryCommunity.com > Manufacturing Community > Forum of High Vacuum Technology/Processing/Coating > Message
Main Menu
Find

[ List Subjects ][ Current Board ][ Post Message ]
[ View Followups ][ Post Followup ]

Subject: etching with PE2400?

Date: 01/28/02 at 11:05 AM
Posted by: Maciej Wojdak
E-mail: mwojdak@phys.uva.nl
Message Posted:

Dear all,

Is it posible to do plasma-etching in Perkin Elmer 2400 sputterer?

I don't have good manual for this system, but
I think this should work when MODE is set to "sputter etch",
target selector to "etch", and of course table in the "etch position".
(Maybe there is something more to know...?)

What value of Ar pressure could be proper for this?
And what should be the value of RF power?

In fact, I want to use etching as a substrate cleaning before deposition.
Maybe this is not the best idea, thus if anybody has some experience with it,
please tell me.

I know this might be silly questions, but I am beginer.

Best regards,
Maciej Wojdak


Follow Ups:


Post a Follow-up:

Name:
E-Mail:
Subject:

Message to Post:

 

Click here:
1999-2001 Sunlit Technology Co., Ltd. All rights reserved.