Is it posible to do plasma-etching in Perkin Elmer 2400 sputterer?
I don't have good manual for this system, but
I think this should work when MODE is set to "sputter etch",
target selector to "etch", and of course table in the "etch position".
(Maybe there is something more to know...?)
What value of Ar pressure could be proper for this?
And what should be the value of RF power?
In fact, I want to use etching as a substrate cleaning before deposition.
Maybe this is not the best idea, thus if anybody has some experience with it,
please tell me.
I know this might be silly questions, but I am beginer.