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Subject: Re: Hollow cathode discharge(HCD) technology

Date: 03/31/00 at 7:14 AM
Posted by: Alex Yuan
E-mail: gct25980@ms33.hinet.net
Message Posted:

In Reply to: Re: Hollow cathode discharge(HCD) technology posted by Kurt Schoedel on 03/29/00 at 2:06 AM:

Hi Kurt,
Thank you for your input on HCD technology.
I have good experiences coating Titanium based films such as TiN, TiCN, Ti2O
with HCD system. But I have some difficulties coating Aluminum and Zirconium based film.
Do you know any technique I can over come this problem.

Thanks

Alex


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