| Home | Terms of Use | Site Map | Contact Us |
IndustryCommunity.com > Manufacturing Community > Forum of High Vacuum Technology/Processing/Coating > Message
Main Menu

[ List Subjects ][ Current Board ][ Post Message ]
[ View Followups ][ Post Followup ]

Subject: Re: Hollow cathode discharge(HCD) technology

Date: 03/29/00 at 2:06 AM
Posted by: Kurt Schoedel
E-mail: kurt@nextsemi.com
Message Posted:

In Reply to: Hollow cathode discharge(HCD) technology posted by Martin on 03/05/00 at 3:14 AM:

The two major ion plating techniques are hollow cathode and cathodic arc. Both are heavily used in hard-coating of machine tools.

hollow cathode advantages:

1) smoother film than cathodic arc for any given deposition rate

disadvantages compared to cathodic arc:

1) power supply and machine design is more complicated
2) Process parameter control is more complicated
3) for any given chamber size, the batch through-put is less

Cathodic arc advantages:

1) more simple control of process parameters
2) power supply and machine design is more simple
3) For any given chamber size, the batch through-put is greater

Cathodic arc disadvantages relative to hollow cathode:

1) Macroparticles - results in rougher films than in the case of hollow cathode deposition

Follow Ups:

Post a Follow-up:


Message to Post:


Click here:
1999-2001 Sunlit Technology Co., Ltd. All rights reserved.