| Home | Terms of Use | Site Map | Contact Us |
IndustryCommunity.com > Manufacturing Community > Forum of High Vacuum Technology/Processing/Coating > Message
Main Menu
Find

[ List Subjects ][ Current Board ][ Post Message ]
[ View Followups ][ Post Followup ]

Subject: Re: sputtering parameters for Al and Cr

Date: 06/22/01 at 3:28 PM
Posted by: Robert Choquette
E-mail: Bobchoquette@aol.com
Message Posted:

In Reply to: sputtering parameters for Al and Cr posted by steve nicoletti on 06/22/01 at 9:06 AM:

I need a little more information about what substrate your trying to coat (material, size), the system specs: cathode size, power available, dc or rf, rotation ability, pumping system (diffusion pump, cryo pump, turbo pump. Send me some info and I would be glads to help you.

Best Wishes,

R. Choquette
Senior Processing Specialist


Follow Ups:


Post a Follow-up:

Name:
E-Mail:
Subject:

Message to Post:

 

Click here:
1999-2001 Sunlit Technology Co., Ltd. All rights reserved.