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Subject: Re: interference fringes technique for stress measurment
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Date: 04/20/01 at 5:40 PM
Posted by: Vasco Teixeira
In Reply to: interference fringes technique for stress measurment posted by benyounes elmrabat on 04/18/01 at 12:56 PM:
I have used in situ and ex situ stress measurement
of thin films deposited by magnetron sputtering.
The technique worked well for metal layers and oxides. We did not yet used in nitrides but there is no problem.
You should use thin substrates to allow the bending of the coated system. Use laser or white light (eg Hg lamp) with a filter (we used green line), the interference can be processed in a Michelson interferometer small objedctive in a reflectence optical microscope.
see some references in http://vteixeira.com.sapo.pt
or contact me: firstname.lastname@example.org
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