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Subject: Dry Etching for HfO2 film (20~30nm)

Date: 06/26/03 at 6:39 PM
Posted by: changhwan
E-mail: chchoi@mail.utexas.edu
Message Posted:

Any body konw which gas is used for removing HfO2 (20~30nm thickness) using dry etching?

If know, could you let me know the recipe?

Thanks.


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